Information for Residency and Fellowship Applicants

In 1882, the New York Skin and Cancer Hospital was founded as the first institution in the United States dedicated exclusively to cutaneous disease. Over the years, the hospital's dermatology program evolved into the NYU Department of Dermatology; through its dedication to clinical and investigative dermatology, the Department has established an international reputation as a standard bearer in clinical care, research and training.

Our Department offers a three-year residency program leading to eligibility for certification by the American Board of Dermatology. Each year, seven or eight residents are appointed. Completion of an internship in internal medicine or pediatrics is required prior to beginning a dermatology residency; this internship may be at any accredited program in the United States. Our Department no longer offers four-year combined internship-residency spots.

In addition to the dermatology residency, fellowship programs in dermatologic research, dermatopathology, dermatopharmacology, melanoma, procedural dermatology, and pediatric dermatology are available in our Department.

For our resident class entering in July 2008, interviews will be held on Monday, January 23, Thursday January 26 and Monday January 30, 2006. The Department participates in the ERAS program, and coordinates our interview dates with other residency programs in the New York City area.

We require a Transcript, Dean's Letter, 3 Letters of Recommendation, USMLE Transcript, and a Personal Statement. A photograph is optional.

More detailed information regarding our department can be found at the following two websites:

1) The Department's web page:
http://www.med.nyu.edu/dermatology/

2) The Department's entry on FREIDA On-line:
http://www.ama-assn.org/vapp/freida/pgm/0,2654,0803521064,00.html

For other information contact either Mr. Craig Burke via email at craig.burke@med.nyu.edu or Dr. Miriam Pomeranz, Director of the Residency Selection Committee miriam.pomeranz@med.nyu.edu.